Andrzej J. Strojwas, Tejas Jhaveri, Vyacheslav Rovner, Lawrence T. Pileggi
Creating an affordable 22nm node using design-lithography co-optimization
DAC, 2009.
@inproceedings{DAC-2009-StrojwasJRP,
author = "Andrzej J. Strojwas and Tejas Jhaveri and Vyacheslav Rovner and Lawrence T. Pileggi",
booktitle = "{Proceedings of the 46th Design Automation Conference}",
doi = "10.1145/1629911.1629941",
isbn = "978-1-60558-497-3",
pages = "95--96",
publisher = "{ACM}",
title = "{Creating an affordable 22nm node using design-lithography co-optimization}",
year = 2009,
}