A fast manufacturability aware Optical Proximity Correction (OPC) algorithm with adaptive wafer image estimation
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Ahmed Awad 0002, Atsushi Takahashi 0001, Chikaaki Kodama
A fast manufacturability aware Optical Proximity Correction (OPC) algorithm with adaptive wafer image estimation
DATE, 2016.

DATE 2016
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@inproceedings{DATE-2016-Awad0K,
	author        = "Ahmed Awad 0002 and Atsushi Takahashi 0001 and Chikaaki Kodama",
	booktitle     = "{Proceedings of the 20th Conference and Exhibition on Design, Automation and Test in Europe}",
	ee            = "http://ieeexplore.ieee.org/document/7459279/",
	isbn          = "978-3-9815-3707-9",
	pages         = "49--54",
	publisher     = "{IEEE}",
	title         = "{A fast manufacturability aware Optical Proximity Correction (OPC) algorithm with adaptive wafer image estimation}",
	year          = 2016,
}


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