Wachirawit Ponghiran, Seongbo Shim, Youngsoo Shin
Cut mask optimization for multi-patterning directed self-assembly lithography
DATE, 2017.
@inproceedings{DATE-2017-PonghiranSS,
author = "Wachirawit Ponghiran and Seongbo Shim and Youngsoo Shin",
booktitle = "{Proceedings of the 21st Conference and Exhibition on Design, Automation and Test in Europe}",
doi = "10.23919/DATE.2017.7927228",
isbn = "978-3-9815370-8-6",
pages = "1498--1503",
publisher = "{IEEE}",
title = "{Cut mask optimization for multi-patterning directed self-assembly lithography}",
year = 2017,
}