Zhenhai Zhu
A parameterized mask model for lithography simulation
DAC, 2009.
@inproceedings{DAC-2009-Zhu, author = "Zhenhai Zhu", booktitle = "{Proceedings of the 46th Design Automation Conference}", doi = "10.1145/1629911.1630158", isbn = "978-1-60558-497-3", pages = "963--968", publisher = "{ACM}", title = "{A parameterized mask model for lithography simulation}", year = 2009, }