Zhenhai Zhu
A parameterized mask model for lithography simulation
DAC, 2009.
@inproceedings{DAC-2009-Zhu,
author = "Zhenhai Zhu",
booktitle = "{Proceedings of the 46th Design Automation Conference}",
doi = "10.1145/1629911.1630158",
isbn = "978-1-60558-497-3",
pages = "963--968",
publisher = "{ACM}",
title = "{A parameterized mask model for lithography simulation}",
year = 2009,
}











