Travelled to:2 × USA
Collaborated with:J.Lund F.Heng I.Graur D.Z.Pan B.Yu X.Xu Y.Lin
Talks about:design (3) rule (2) pattern (1) multipl (1) altern (1) shift (1) readi (1) phase (1) logic (1) level (1)
Person: Lars Liebmann
DBLP: Liebmann:Lars
Contributed to:
20152001Wrote 2 papers:
- DAC-2015-PanLYXL #multi #question
- Pushing multiple patterning in sub-10nm: are we ready? (DZP, LL, BY, XX, YL), p. 6.
- DAC-2001-LiebmannLHG #design #logic
- Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking (LL, JL, FLH, IG), pp. 79–84.