Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography
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Yongchan Ban, David Z. Pan
Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography
DAC, 2010.

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@inproceedings{DAC-2010-BanP,
	author        = "Yongchan Ban and David Z. Pan",
	booktitle     = "{Proceedings of the 47th Design Automation Conference}",
	doi           = "10.1145/1837274.1837375",
	isbn          = "978-1-4503-0002-5",
	pages         = "408--411",
	publisher     = "{ACM}",
	title         = "{Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography}",
	year          = 2010,
}

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