Travelled to:3 × USA
Collaborated with:D.Z.Pan J.Yang K.Lucas M.Cho K.Yuan
Talks about:lithographi (3) layout (3) compact (2) optim (2) model (2) awar (2) wavelength (1) decomposit (1) framework (1) printabl (1)
Person: Yongchan Ban
DBLP: Ban:Yongchan
Contributed to:
201120102008Wrote 4 papers:
- DAC-2011-BanLP #2d #composition #flexibility #framework #layout
- Flexible 2D layout decomposition framework for spacer-type double pattering lithography (YB, KL, DZP), pp. 789–794.
- DAC-2011-BanY #layout #modelling #optimisation
- Layout aware line-edge roughness modeling and poly optimization for leakage minimization (YB, JSY), pp. 447–452.
- DAC-2010-BanP #layout #modelling #optimisation #robust
- Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography (YB, DZP), pp. 408–411.
- DAC-2008-ChoYBP #named #performance #predict
- ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction (MC, KY, YB, DZP), pp. 504–509.