BibSLEIGH corpus
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Open Knowledge
XHTML 1.0 W3C Rec
CSS 2.1 W3C CanRec
email twitter
Travelled to:
3 × USA
Collaborated with:
D.Z.Pan J.Yang K.Lucas M.Cho K.Yuan
Talks about:
lithographi (3) layout (3) compact (2) optim (2) model (2) awar (2) wavelength (1) decomposit (1) framework (1) printabl (1)

Person: Yongchan Ban

DBLP DBLP: Ban:Yongchan

Contributed to:

DAC 20112011
DAC 20102010
DAC 20082008

Wrote 4 papers:

DAC-2011-BanLP #2d #composition #flexibility #framework #layout
Flexible 2D layout decomposition framework for spacer-type double pattering lithography (YB, KL, DZP), pp. 789–794.
DAC-2011-BanY #layout #modelling #optimisation
Layout aware line-edge roughness modeling and poly optimization for leakage minimization (YB, JSY), pp. 447–452.
DAC-2010-BanP #layout #modelling #optimisation #robust
Compact modeling and robust layout optimization for contacts in deep sub-wavelength lithography (YB, DZP), pp. 408–411.
DAC-2008-ChoYBP #named #performance #predict
ELIAD: efficient lithography aware detailed router with compact post-OPC printability prediction (MC, KY, YB, DZP), pp. 504–509.

Bibliography of Software Language Engineering in Generated Hypertext (BibSLEIGH) is created and maintained by Dr. Vadim Zaytsev.
Hosted as a part of SLEBOK on GitHub.