Travelled to:1 × USA
Collaborated with:H.Ou Y.Chang J.Liu I.Wu
Talks about:placement (2) analog (2) awar (2) lithographi (1) structur (1) pattern (1) layout (1) effect (1) depend (1) analyt (1)
Person: Kai-Han Tseng
DBLP: Tseng:Kai=Han
Contributed to:
2015Wrote 2 papers:
- DAC-2015-OuTC #self
- Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography (HCO, KHT, YWC), p. 6.
- DAC-2015-OuTLWC
- Layout-dependent-effects-aware analytical analog placement (HCO, KHT, JYL, IPW, YWC), p. 6.