@inproceedings{DAC-2009-YuanLP,
	author        = "Kun Yuan and Katrina Lu and David Z. Pan",
	booktitle     = "{Proceedings of the 46th Design Automation Conference}",
	doi           = "10.1145/1629911.1629930",
	isbn          = "978-1-60558-497-3",
	pages         = "63--66",
	publisher     = "{ACM}",
	title         = "{Double patterning lithography friendly detailed routing with redundant via consideration}",
	year          = 2009,
}