@inproceedings{DAC-2013-YuYGP,
	author        = "Bei Yu and Kun Yuan and Jhih-Rong Gao and David Z. Pan",
	booktitle     = "{Proceedings of the 50th Annual Design Automation Conference}",
	doi           = "10.1145/2463209.2488819",
	isbn          = "978-1-4503-2071-9",
	pages         = "7",
	publisher     = "{ACM}",
	title         = "{E-BLOW: e-beam lithography overlapping aware stencil planning for MCC system}",
	year          = 2013,
}