Hung-Chih Ou, Kai-Han Tseng, Yao-Wen Chang
Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography
DAC, 2015.
@inproceedings{DAC-2015-OuTC, author = "Hung-Chih Ou and Kai-Han Tseng and Yao-Wen Chang", booktitle = "{Proceedings of the 52nd Annual Design Automation Conference}", doi = "10.1145/2744769.2744813", isbn = "978-1-4503-3520-1", pages = "6", publisher = "{ACM}", title = "{Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography}", year = 2015, }