Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography
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Hung-Chih Ou, Kai-Han Tseng, Yao-Wen Chang
Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography
DAC, 2015.

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@inproceedings{DAC-2015-OuTC,
	author        = "Hung-Chih Ou and Kai-Han Tseng and Yao-Wen Chang",
	booktitle     = "{Proceedings of the 52nd Annual Design Automation Conference}",
	doi           = "10.1145/2744769.2744813",
	isbn          = "978-1-4503-3520-1",
	pages         = "6",
	publisher     = "{ACM}",
	title         = "{Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography}",
	year          = 2015,
}

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