Hung-Chih Ou, Kai-Han Tseng, Yao-Wen Chang
Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography
DAC, 2015.
@inproceedings{DAC-2015-OuTC,
author = "Hung-Chih Ou and Kai-Han Tseng and Yao-Wen Chang",
booktitle = "{Proceedings of the 52nd Annual Design Automation Conference}",
doi = "10.1145/2744769.2744813",
isbn = "978-1-4503-3520-1",
pages = "6",
publisher = "{ACM}",
title = "{Cutting structure-aware analog placement based on self-aligned double patterning with e-beam lithography}",
year = 2015,
}











