5 papers:
DAC-2015-DingCM #self- Detailed routing for spacer-is-metal type self-aligned double/quadruple patterning lithography (YD, CCNC, WKM), p. 6.
- DAC-2013-Du0SSLMW #self
- Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography (YD, QM, HS, JS, GLP, AM, MDFW), p. 6.
- DAC-2011-BanLP #2d #composition #flexibility #framework #layout
- Flexible 2D layout decomposition framework for spacer-type double pattering lithography (YB, KL, DZP), pp. 789–794.
- DAC-2009-JamaaLM #array #multi
- Decoding nanowire arrays fabricated with the multi-spacer patterning technique (MHBJ, YL, GDM), pp. 77–82.
- DAC-1987-XiongK #named #performance
- Nutcracker: An Efficient and Intelligent Channel Spacer (XMX, ESK), pp. 298–304.
