Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography
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Yuelin Du, Qiang Ma, Hua Song, James Shiely, Gerard Luk-Pat, Alexander Miloslavsky, Martin D. F. Wong
Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography
DAC, 2013.

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@inproceedings{DAC-2013-Du0SSLMW,
	author        = "Yuelin Du and Qiang Ma and Hua Song and James Shiely and Gerard Luk-Pat and Alexander Miloslavsky and Martin D. F. Wong",
	booktitle     = "{Proceedings of the 50th Annual Design Automation Conference}",
	doi           = "10.1145/2463209.2488848",
	isbn          = "978-1-4503-2071-9",
	pages         = "6",
	publisher     = "{ACM}",
	title         = "{Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography}",
	year          = 2013,
}

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