Process variation aware OPC with variational lithography modeling
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Peng Yu, Sean X. Shi, David Z. Pan
Process variation aware OPC with variational lithography modeling
DAC, 2006.

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@inproceedings{DAC-2006-YuSP,
	author        = "Peng Yu and Sean X. Shi and David Z. Pan",
	booktitle     = "{Proceedings of the 43rd Design Automation Conference}",
	doi           = "10.1145/1146909.1147108",
	isbn          = "1-59593-381-6",
	pages         = "785--790",
	publisher     = "{ACM}",
	title         = "{Process variation aware OPC with variational lithography modeling}",
	year          = 2006,
}

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