Peng Yu, Sean X. Shi, David Z. Pan
Process variation aware OPC with variational lithography modeling
DAC, 2006.
@inproceedings{DAC-2006-YuSP, author = "Peng Yu and Sean X. Shi and David Z. Pan", booktitle = "{Proceedings of the 43rd Design Automation Conference}", doi = "10.1145/1146909.1147108", isbn = "1-59593-381-6", pages = "785--790", publisher = "{ACM}", title = "{Process variation aware OPC with variational lithography modeling}", year = 2006, }