Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang
Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process
DAC, 2014.
@inproceedings{DAC-2014-LiuFC, author = "Iou-Jen Liu and Shao-Yun Fang and Yao-Wen Chang", booktitle = "{Proceedings of the 51st Annual Design Automation Conference}", doi = "10.1145/2593069.2593176", isbn = "978-1-4503-2730-5", pages = "6", publisher = "{ACM}", title = "{Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process}", year = 2014, }