4 × USA
Y.Chang I.Liu R.Liu W.Chen
lithographi (3) pattern (2) flare (2) rout (2) beam (2) awar (2) manufactur (1) decomposit (1) algorithm (1) simultan (1)
Person: Shao-Yun Fang
Wrote 5 papers:
- DAC-2015-ChangLF #challenge
- EUV and e-beam manufacturability: challenges and solutions (YWC, RGL, SYF), p. 6.
- DAC-2014-LiuFC #process #self #using
- Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process (IJL, SYF, YWC), p. 6.
- DAC-2013-FangLC #multi
- Stitch-aware routing for multiple e-beam lithography (SYF, IJL, YWC), p. 6.
- Simultaneous flare level and flare variation minimization with dummification in EUVL (SYF, YWC), pp. 1179–1184.
- DAC-2012-FangCC #algorithm #composition #layout #novel
- A novel layout decomposition algorithm for triple patterning lithography (SYF, YWC, WYC), pp. 1185–1190.