Travelled to:1 × USA
Collaborated with:H.C.Chien H.Ou T.Chen Y.Chang
Talks about:lithographi (1) placement (1) pattern (1) analog (1) doubl (1) awar (1)
Person: Ta-Yu Kuan
DBLP: Kuan:Ta=Yu
Contributed to:
Wrote 1 papers:
- DAC-2013-ChienOCKC
- Double patterning lithography-aware analog placement (HCCC, HCO, TCC, TYK, YWC), p. 6.












