Peng Yu, Sean X. Shi, David Z. Pan
Process variation aware OPC with variational lithography modeling
DAC, 2006.
@inproceedings{DAC-2006-YuSP,
author = "Peng Yu and Sean X. Shi and David Z. Pan",
booktitle = "{Proceedings of the 43rd Design Automation Conference}",
doi = "10.1145/1146909.1147108",
isbn = "1-59593-381-6",
pages = "785--790",
publisher = "{ACM}",
title = "{Process variation aware OPC with variational lithography modeling}",
year = 2006,
}











