Travelled to:4 × USA
Collaborated with:M.D.F.Wong H.Zhang E.F.Y.Young H.Kong T.Yan Y.Du H.Song J.Shiely G.Luk-Pat A.Miloslavsky
Talks about:rout (5) pattern (3) algorithm (2) optim (2) doubl (2) awar (2) lithographi (1) comparison (1) technolog (1) compliant (1)
Person: Qiang Ma
DBLP: Ma:Qiang
Contributed to:
2013201220112010Wrote 4 papers:
- DAC-2013-Du0SSLMW #self
- Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography (YD, QM, HS, JS, GLP, AM, MDFW), p. 6.
- DAC-2012-0002ZW #comparison
- Triple patterning aware routing and its comparison with double patterning aware routing in 14nm technology (QM, HZ, MDFW), pp. 591–596.
- DAC-2011-MaYW #algorithm
- An optimal algorithm for layer assignment of bus escape routing on PCBs (QM, EFYY, MDFW), pp. 176–181.
- DAC-2010-KongMYW #algorithm
- An optimal algorithm for finding disjoint rectangles and its application to PCB routing (HK, QM, TY, MDFW), pp. 212–217.