Travelled to:2 × USA
Collaborated with:C.C.N.Chu W.Mak X.Zhou C.Chu
Talks about:pattern (2) lithographi (1) throughput (1) manufactur (1) algorithm (1) quadrupl (1) spacer (1) raster (1) layout (1) invari (1)
Person: Yixiao Ding
DBLP: Ding:Yixiao
Contributed to:
20152014Wrote 3 papers:
- DAC-2015-DingCM #self
- Detailed routing for spacer-is-metal type self-aligned double/quadruple patterning lithography (YD, CCNC, WKM), p. 6.
- DAC-2015-DingCZ #algorithm #invariant #performance
- An efficient shift invariant rasterization algorithm for all-angle mask patterns in ILT (YD, CCNC, XZ), p. 6.
- DAC-2014-DingCM #layout #optimisation #throughput
- Throughput Optimization for SADP and E-beam based Manufacturing of 1D Layout (YD, CC, WKM), p. 6.