Iou-Jen Liu, Shao-Yun Fang, Yao-Wen Chang
Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process
DAC, 2014.
@inproceedings{DAC-2014-LiuFC,
author = "Iou-Jen Liu and Shao-Yun Fang and Yao-Wen Chang",
booktitle = "{Proceedings of the 51st Annual Design Automation Conference}",
doi = "10.1145/2593069.2593176",
isbn = "978-1-4503-2730-5",
pages = "6",
publisher = "{ACM}",
title = "{Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process}",
year = 2014,
}











