Travelled to:
2 × USA
Collaborated with:
S.Fang Y.Chang
Talks about:
lithographi (2) rout (2) awar (2) process (1) pattern (1) overlay (1) multipl (1) stitch (1) detail (1) doubl (1)
Person: Iou-Jen Liu
DBLP: Liu:Iou=Jen
Contributed to:
Wrote 2 papers:
- DAC-2014-LiuFC #process #self #using
- Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process (IJL, SYF, YWC), p. 6.
- DAC-2013-FangLC #multi
- Stitch-aware routing for multiple e-beam lithography (SYF, IJL, YWC), p. 6.