Travelled to:
1 × USA
Collaborated with:
Y.Du Q.Ma H.Song J.Shiely A.Miloslavsky M.D.F.Wong
Talks about:
lithographi (1) compliant (1) dielectr (1) pattern (1) spacer (1) detail (1) doubl (1) align (1) self (1) rout (1)
Person: Gerard Luk-Pat
DBLP: Luk-Pat:Gerard
Contributed to:
Wrote 1 papers:
- DAC-2013-Du0SSLMW #self
- Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography (YD, QM, HS, JS, GLP, AM, MDFW), p. 6.