Travelled to:
1 × Germany
3 × USA
Collaborated with:
M.D.F.Wong H.Zhang R.O.Topaloglu Z.Xiao H.Tian H.Yi H.P.Wong Q.Ma H.Song J.Shiely G.Luk-Pat A.Miloslavsky
Talks about:
pattern (3) self (3) detail (2) doubl (2) align (2) lithographi (1) decomposit (1) placement (1) compliant (1) standard (1)
Person: Yuelin Du
DBLP: Du:Yuelin
Contributed to:
Wrote 4 papers:
- DAC-2014-XiaoDTWYWZ #self #verification
- Directed Self-Assembly (DSA) Template Pattern Verification (ZX, YD, HT, MDFW, HY, HSPW, HZ), p. 6.
- DATE-2014-DuW #optimisation #process #standard
- Optimization of standard cell based detailed placement for 16 nm FinFET process (YD, MDFW), pp. 1–6.
- DAC-2013-Du0SSLMW #self
- Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography (YD, QM, HS, JS, GLP, AM, MDFW), p. 6.
- DAC-2011-ZhangDWT #composition #detection #self
- Self-aligned double patterning decomposition for overlay minimization and hot spot detection (HZ, YD, MDFW, ROT), pp. 71–76.