Travelled to:1 × Germany
1 × India
1 × Korea
1 × USA
1 × United Kingdom
Collaborated with:D.Malerba F.Esposito F.A.Lisi M.Berardi M.Ceci
Talks about:document (4) process (2) analysi (2) layout (2) learn (2) understand (1) censorship (1) discoveri (1) techniqu (1) interact (1)
Person: Oronzo Altamura
DBLP: Altamura:Oronzo
Contributed to:
2005200320011999
1999Wrote 5 papers:
- ICDAR-2005-BerardiACM #analysis #layout #process
- A color-based layout analysis to process censorship cards of film archives (MB, OA, MC, DM), pp. 1110–1114.
- ICDAR-2003-MalerbaEACB #approach #documentation #layout #machine learning
- Correcting the Document Layout: A Machine Learning Approach (DM, FE, OA, MC, MB), p. 97–?.
- ICDAR-2001-MalerbaELA #automation #component #comprehension #dependence #documentation #image #logic
- Automated Discovery of Dependencies Between Logical Components in Document Image Understanding (DM, FE, FAL, OA), pp. 174–178.
- ICDAR-1999-AltamuraEM #adaptation #analysis #documentation #interactive
- WISDOM++: An Interactive and Adaptive Document Analysis System (OA, FE, DM), pp. 366–369.
- MLDM-1999-AltamuraELM #documentation #learning
- Symbolic Learning Techniques in Paper Document Processing (OA, FE, FAL, DM), pp. 159–173.