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Travelled to:
1 × France
1 × Germany
3 × USA
Collaborated with:
C.Chiang J.Guo F.Yang X.Zeng Y.Yu Y.Chan I.H.Jiang K.Hsu Y.Pi T.Ho Y.Yang A.G.Veneris R.K.Brayton D.E.Smith J.Luo Q.Su J.Kawa A.B.Kahng X.Xu A.Zelikovsky
Talks about:
hotspot (2) detect (2) accur (2) manufactur (1) lithograph (1) distribut (1) algorithm (1) sequenti (1) geometri (1) conflict (1)

Person: Subarna Sinha

DBLP DBLP: Sinha:Subarna

Contributed to:

DAC 20122012
DAC 20112011
DATE 20092009
DAC 20062006
DATE 20052005

Wrote 6 papers:

DAC-2012-GuoYSCZ #classification #distance #metric
Improved tangent space based distance metric for accurate lithographic hotspot classification (JG, FY, SS, CC, XZ), pp. 1173–1178.
DAC-2012-YuCSJC #design #detection #using
Accurate process-hotspot detection using critical design rule extraction (YTY, YCC, SS, IHRJ, CC), pp. 1167–1172.
DAC-2011-HsuSPCH #algorithm #distributed #geometry #layout
A distributed algorithm for layout geometry operations (KTH, SS, YCP, CC, TYH), pp. 182–187.
DATE-2009-YangSVBS #approximate #logic
Sequential logic rectifications with approximate SPFDs (YSY, SS, AGV, RKB, DES), pp. 1698–1703.
DAC-2006-LuoSSKC
An IC manufacturing yield model considering intra-die variations (JL, SS, QS, JK, CC), pp. 749–754.
DATE-2005-ChiangKSXZ #detection
Bright-Field AAPSM Conflict Detection and Correction (CC, ABK, SS, XX, AZ), pp. 908–913.

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