26 papers:
CASE-2015-TiengYC #precise #tool support- Total precision inspection of machine tools with virtual metrology (HT, HCY, FTC), pp. 1446–1447.
- CASE-2014-HuiM #assessment #performance #reduction
- Performance assessment of virtual metrology in APC applications for the viability of sampling reductions (KH, JM), pp. 750–755.
- CASE-2014-HungLHTC #development
- Development of a private cloud-based new-generation virtual metrology system (MHH, YCL, HCH, CCT, FTC), pp. 910–915.
- CASE-2013-KurzDP #monitoring #reliability
- Monitoring virtual metrology reliability in a sampling decision system (DK, CDL, JP), pp. 20–25.
- CASE-2013-PanahiASG #algorithm #performance #proximity
- An efficient proximity probing algorithm for metrology (FP, AA, AFvdS, KG), pp. 342–349.
- CASE-2013-SustoJOM #multi #predict #process
- Virtual metrology enabled early stage prediction for enhanced control of multi-stage fabrication processes (GAS, ABJ, PGO, SFM), pp. 201–206.
SIGMOD-2013-CurrimSSZJY #query- DBMS metrology: measuring query time (SC, RTS, YKS, RZ, MWJ, CY), pp. 421–432.
- CASE-2012-HsiehCY
- Virtual-metrology-based FDC scheme (YSH, FTC, HCY), pp. 80–85.
- CASE-2012-KurzDP #using
- Sampling Decision System in semiconductor manufacturing using Virtual Metrology (DK, CDL, JP), pp. 74–79.
- CASE-2012-PampuriSSLBN #multi #process
- Multistep virtual metrology approaches for semiconductor manufacturing processes (SP, AS, GAS, CDL, AB, GDN), pp. 91–96.
- CASE-2012-SustoSPNB #approach
- An information-theory and Virtual Metrology-based approach to Run-to-Run semiconductor manufacturing control (GAS, AS, SP, GDN, AB), pp. 358–363.
- CASE-2011-KaoCW #case study
- Preliminary study of run-to-run control utilizing virtual metrology with reliance index (CAK, FTC, WMW), pp. 256–261.
- CASE-2011-PampuriSFN #multi
- Multilevel Lasso applied to Virtual Metrology in semiconductor manufacturing (SP, AS, GF, GDN), pp. 244–249.
- CASE-2010-HungHYC #automation #development #framework #industrial
- Development of an automatic virtual metrology framework for TFT-LCD industry (MHH, HCH, HCY, FTC), pp. 879–884.
ICPR-2010-PengHRYZ #orthogonal- Single View Metrology Along Orthogonal Directions (KP, LH, RR, XY, HZ), pp. 1658–1661.
- CASE-2009-ChenHB
- Optimum sampling for track PEB CD Integrated Metrology (AC, SH, JB), pp. 439–442.
- CASE-2009-WuCLZCH
- Advanced studies of selection schemes for dual virtual-metrology outputs (WMW, FTC, THL, DLZ, JFC, MHH), pp. 421–426.
- CASE-2008-HuangHCLC #automation #design #implementation
- Automatic virtual metrology system design and implementation (YTH, HCH, FTC, TSL, FCC), pp. 223–229.
- CASE-2008-WuCZLC
- Developing a selection scheme for dual virtual-metrology outputs (WMW, FTC, DLZ, THL, JFC), pp. 230–235.
- ICPR-2008-DengWWD #image #visual notation
- Visual metrology with uncalibrated radial distorted images (XD, FW, YW, FD), pp. 1–4.
- CASE-2007-ChengHK #development
- Development of a Dual-Phase Virtual Metrology Scheme (FTC, HCH, CAK), pp. 270–275.
- CASE-2007-HuangSCJ #development #framework
- Development of a Generic Virtual Metrology Framework (HCH, YCS, FTC, JMJ), pp. 282–287.
- CASE-2007-SuLCW #algorithm #implementation
- Implementation Considerations of Various Virtual Metrology Algorithms (YCS, THL, FTC, WMW), pp. 276–281.
- ICPR-v1-2004-LiangCP
- Uncalibrated Two-View Metrology (BL, ZC, NP), pp. 96–99.
- ICPR-v1-2002-MuralikrishnanNR #clustering #correlation #functional #novel #process
- Process Mapping and Functional Correlation in Surface Metrology: A Novel Clustering Application (BM, KN, JR), pp. 29–32.
- ICPR-v2-2002-WangWH #approach #novel
- A Novel Approach for Single View Based Plane Metrology (GW, YW, ZH), pp. 556–559.
