Travelled to:1 × Germany
2 × France
Collaborated with:S.Kundu A.Sanyal
Talks about:test (3) lithographi (2) lithograph (2) process (2) variat (2) design (2) model (2) base (2) manufactur (1) linewidth (1)
Person: Aswin Sreedhar
DBLP: Sreedhar:Aswin
Contributed to:
201120092008Wrote 5 papers:
- DATE-2011-KunduS #design #modelling #process
- Modeling manufacturing process variation for design and test (SK, AS), pp. 1147–1152.
- DATE-2011-SreedharK #design #identification #on the #process
- On design of test structures for lithographic process corner identification (AS, SK), pp. 800–805.
- DATE-2011-SreedharK11a #security
- Physically unclonable functions for embeded security based on lithographic variation (AS, SK), pp. 1632–1637.
- DATE-2009-SreedharK #analysis #on the
- On linewidth-based yield analysis for nanometer lithography (AS, SK), pp. 381–386.
- DATE-2008-SreedharSK #fault #modelling #on the #testing
- On Modeling and Testing of Lithography Related Open Faults in Nano-CMOS Circuits (AS, AS, SK), pp. 616–621.